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The SPIE Photomask Technology Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the world’s largest forum to discuss the latest mask technologies and how they can meet the needs of the rapidly moving semiconductor industry. Co-located with SPIE Scanning Microscopy 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications.
Mask Making
+ Mask data preparation
+ Substrates and materials
+ Patterning tools and processes
+ Resist and resist processing
+ Etch techniques
+ Metrology
+ Inspection
+ Repair
+ Cleaning, contamination, and haze
+ Simulation of mask making
9-inch Glass
+ Impact of 450mm wafers on reticle and infrastructure
+ Tool developments to support larger blanks
+ Material developments
Mask Business
+ EUV mask making
+ EUV mask inspection and repair
+ EUV mask infrastructure
+ EUV mask application
+ Nanoimprint mask making
+ Nanoimprint mask application
+ Pixelated masks
+ Alternative mask technologies
+ Grey-scale masks
+ Direct-write, ML²
Exhibition Dates and Hours:
Tuesday 29 September | 10:00 am to 4:30 pm; 6:00 to 7:00 pm
Wednesday 30 September | 10:00 am to 4:00 pm
Source : Event Website
Event Name | City | State | Atendance | Exhibitors | Date |
---|---|---|---|---|---|
SPIE Photomask Technology 2025 | Monterey | California | ![]() estimated |
![]() estimated |
Sep 21, 2025 |
SPIE Photomask Technology 2024 | Monterey | California | ![]() verified |
![]() verified |
Sep 29, 2024 |
SPIE Photomask Technology 2023 | Monterey | California | - | ![]() verified |
Oct 01, 2023 |
SPIE Photomask Technology 2022 | Monterey | California | - | ![]() verified |
Sep 25, 2022 |
SPIE Photomask Technology 2021 | Monterey | California | - | ![]() verified |
Sep 27, 2021 |
SPIE Photomask Technology 2016 | - | - | Sep 12, 2016 | ||
SPIE Photomask Technology 2015 | Monterey | California | - | - | Sep 29, 2015 |
SPIE Photomask Technology 2014 | Monterey | California | - | - | Sep 16, 2014 |
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