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SPIE Photomask Technology 2025

Why Attend

Overview

SPIE Photomask Technology + Extreme Ultraviolet Lithography is the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Why Attend – 2022

The leading multidisciplinary meeting is focused on global breakthroughs and challenges within photomask technology and EUVL. This conference is where researchers and scientists gather to share latest advances across two conferences.

SPIE Photomask Technology is a global forum for scientists and engineers to present and discuss photomask design, fabrication, quality control, and applications in the semiconductor industry. Its co-location with the EUV Lithography Symposium in a single setting presents a unique opportunity to meet and share results, challenges, and potential solutions in the EUV and DUV worlds.

Attendees will be able to hear world-class speakers address hot topics and answer specific questions. They also can connect and explore important topics in depth at technical events designed to provide focused discussions and learning.

Special events are designed to help students gain knowledge about the industry, build important skills, and network with leaders in the field.

The International Conference on Extreme Ultraviolet Lithography provides a forum to discuss and assess the worldwide status of EUV technology and infrastructure readiness. Scientists, engineers, and industry leaders meet to present and discuss new and unpublished materials. They address the main challenges associated with the extendibility of the technology to smaller dimensions.

Why Exhibit – 2022

At the premier technical meeting for mask makers, EUVL, and emerging technologies, exhibitors can showcase the newest products, innovations, and latest technologies.

The event helps connect researchers, scientists, engineers, and buyers with potential suppliers, while educating the community about new technical possibilities.

Organizer

SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies.

Serving 255,000 constituents from 183 countries, the not-for-profit society advances emerging technologies through interdisciplinary information exchange, continuing education, publications, patent precedent, and career and professional growth.

Source: Event Website

Source : Event Website

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Future and Past Event Dates

Event Name City State Atendance Exhibitors Date
SPIE Photomask Technology 2025 Monterey California Estimated
estimated
Estimated
estimated
Sep 21, 2025
SPIE Photomask Technology 2024 Monterey California verified
verified
verified
verified
Sep 29, 2024
SPIE Photomask Technology 2023 Monterey California - verified
verified
Oct 01, 2023

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